ABOUT THIS WORKSHOP
This workshop will focus on photo silkscreen methods, which means images will be exposed onto a screen using UV light. This technique can be used with line drawings, photographs, and mark making.
Wayne Montecalvo is a multi-disciplinary artist who holds a Bachelor of Fine Arts degree from the School of Visual Arts in New York City. He currently lives and maintains his studio in Rosendale, New York. Wayne’s work has been featured in recent solo and twoperson exhibitions at The Hall of Awa Japanese Handmade Paper, Yamakawa, Tokushima, Japan; Muroff Kotler Visual Arts Gallery, SUNY Ulster, Stone Ridge, NY; and CHRCH Project Space, Cottekill, NY. Wayne’s awards and honors include the 2016 Awagami Artist-in-Residence Program in Japan; Two Full Fellowship Awards from the Vermont Studio Center; Two Residencies at the Frans Masereel Zentrum voor Grafiek, Kasterlee, Belgium and the John Michael Kohler Foundation Arts/Industry Artist-in-Residence, Sheboygan, WI. From 1998-2013 Wayne taught in the Art Department at the State University of New York, New Paltz campus. Additional teaching and related experience include R&F Handmade Paints, Pilchuck Glass School, the Printmaking Center at the College of Santa Fe, and Bard College.
In an effort to maintain our non-toxic environment, the Woodstock School of Art does not permit the use of turpentine or mineral spirits in the painting studios. Additionally, please refrain from wearing perfume, cologne or scents of any kind. Learn more.
$360 ($330 tuition + $30 lab fee)
July 7–9, 2020, Tuesday-Thursday, 9 AM–4 PM
Those with special needs and/or requests may email the registrar.
Please note that for workshops lasting all day there is a one-hour break from twelve noon to one PM. Students are invited to bring lunch and eat at the school or may go to any of the local dining establishments. The school does not provide lunch or refreshments.